[Federal Register Volume 68, Number 117 (Wednesday, June 18, 2003)]
[Notices]
[Page 36545]
From the Federal Register Online via the Government Publishing Office [www.gpo.gov]
[FR Doc No: 03-15321]


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DEPARTMENT OF DEFENSE

Department of the Navy


Notice of Availability of Government-Owned Invention; Available 
for Licensing

AGENCY: Department of the Navy, DoD.

ACTION: Notice.

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SUMMARY: The invention listed below is assigned to the United States 
Government as represented by the Secretary of the Navy and is available 
for licensing by the Department of the Navy. Navy Case No. 82,897, 
entitled ``Anti-Charging Layer for Beam Lithography and Mask 
Fabrication.''

ADDRESSES: Requests for information about the invention cited should be 
directed to the Naval Research Laboratory, Code 1004, 4555 Overlook 
Avenue, SW., Washington, DC 20375-5320, and must include the Navy Case 
number.

FOR FURTHER INFORMATION CONTACT: Catherine M. Cotell, Ph.D., Head, 
Technology Transfer Office, NRL Code 1004, 4555 Overlook Avenue, SW., 
Washington, DC 20375-5320, telephone (202) 767-7230. Due to temporary 
U.S. Postal Service delays, please fax (202) 404-7920, E-Mail: 
[email protected] or use courier delivery to expedite response.

(Authority: 35 U.S.C. 207, 37 CFR Part 404.)

    Dated: June 11, 2003.
E.F. McDonnell,
Major, U.S. Marine Corps, Federal Register Liaison Officer.
[FR Doc. 03-15321 Filed 6-17-03; 8:45 am]
BILLING CODE 3810-FF-P