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<bill bill-stage="Introduced-in-House" dms-id="H2A9630F1880F45FAB95D5AC16D2953A4" public-private="public" key="H" bill-type="olc"><metadata xmlns:dc="http://purl.org/dc/elements/1.1/">
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<dc:title>119 HR 6275 IH: China AI Power Report Act</dc:title>
<dc:publisher>U.S. House of Representatives</dc:publisher>
<dc:date>2025-11-21</dc:date>
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<dc:language>EN</dc:language>
<dc:rights>Pursuant to Title 17 Section 105 of the United States Code, this file is not subject to copyright protection and is in the public domain.</dc:rights>
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<distribution-code display="yes">I</distribution-code><congress display="yes">119th CONGRESS</congress><session display="yes">1st Session</session><legis-num display="yes">H. R. 6275</legis-num><current-chamber>IN THE HOUSE OF REPRESENTATIVES</current-chamber><action display="yes"><action-date date="20251121">November 21, 2025</action-date><action-desc><sponsor name-id="M001219">Mr. Moylan</sponsor> (for himself, <cosponsor name-id="V000138">Mr. Vindman</cosponsor>, and <cosponsor name-id="H001058">Mr. Huizenga</cosponsor>) introduced the following bill; which was referred to the <committee-name committee-id="HFA00">Committee on Foreign Affairs</committee-name></action-desc></action><legis-type>A BILL</legis-type><official-title display="yes">To require the Secretary of Commerce to submit a report annually on the advanced artificial intelligence capabilities of the People’s Republic of China, and for other purposes.</official-title></form><legis-body id="HF3B5488D40C54168950A22A97DB71476" style="OLC"><section id="H92FEF8A242D64E6AB61303EAA37F6724" section-type="section-one"><enum>1.</enum><header>Short title</header><text display-inline="no-display-inline">This Act may be cited as the <quote><short-title>China AI Power Report Act</short-title></quote>.</text></section><section id="HF180276026EB43A2B668ECAE87D2F5E4"><enum>2.</enum><header>Sense of Congress</header><text display-inline="no-display-inline">It is the sense of Congress that—</text><paragraph id="HDE764CFB4FB046E087D7675EC62A4359"><enum>(1)</enum><text>export controls on artificial intelligence technologies and related capabilities must be dynamic and adaptive to effectively address the evolving national security challenges posed by the People’s Republic of China (<quote>China</quote>);</text></paragraph><paragraph id="HEE4CE673D16044658B06041E16E4AA17"><enum>(2)</enum><text>such controls should be regularly updated to reflect rapid technological innovations, China’s advancing capabilities, and emerging methods of diversion, circumvention, and avoidance, to ensure the United States maintains its strategic advantage and to protect the national security interests of the United States; and</text></paragraph><paragraph id="H57395B96849A421CAE869EA2C59A7CED"><enum>(3)</enum><text>to ensure Congress can exercise oversight and, as necessary, update export control authorities to enable necessary updates to export controls, Congress must be kept fully and currently informed of the current and projected future states of China’s artificial intelligence capabilities.</text></paragraph></section><section id="HA279E0CEFF544B2ABC13631801650621"><enum>3.</enum><header>Report on artificial intelligence power of china</header><subsection id="H0F495A2E76D24A9BA17CA8BD0A69B6AC"><enum>(a)</enum><header>In general</header><text>Not later than 180 days after the date of the enactment of this Act, and annually thereafter for 3 years, the Secretary of Commerce, in consultation with the covered agency heads, shall submit to the Committee on Foreign Affairs of the House of Representatives and the Committee on Banking, Housing, and Urban Affairs of the Senate a report on the advanced artificial intelligence capabilities of China, including the efforts by China relating to supply chains for advanced artificial intelligence systems.</text></subsection><subsection id="HC58AF779440F43F496B880BE0F42198E"><enum>(b)</enum><header>Components</header><text>Each report required under subsection (a) shall also include the following:</text><paragraph id="H777DCCFA41E04716BD03D4D99DDA9D50"><enum>(1)</enum><text>An assessment of integrated circuits designed or optimized for advanced artificial intelligence training or inference by leading artificial intelligence chip designers in China, including Huawei Technologies Co., Ltd. and Cambricon Technologies, that includes—</text><subparagraph id="H6EA83C6D50A34DE0BAEB351F6FB4FAC6"><enum>(A)</enum><text>with respect to such integrated circuits, the—</text><clause id="HAA362BBF346B49FFBF22A68EB9671D30"><enum>(i)</enum><text>total processing power;</text></clause><clause id="H6F7516DF65FE462D97A972AAA0F29530"><enum>(ii)</enum><text>integer and floating point operations per second at relevant precision levels;</text></clause><clause id="H8B40C6A01E244A38931BB679C12292F2"><enum>(iii)</enum><text>memory capacity and bandwidth;</text></clause><clause id="H037F7C468C2048799781B21018217CD3"><enum>(iv)</enum><text>interconnect bandwidth;</text></clause><clause id="H83AAF1E75CC945E7A79837A76CD8E138"><enum>(v)</enum><text>power efficiency;</text></clause><clause id="HBF91F9F1D3DD40EC844A35750C464F54"><enum>(vi)</enum><text>transistor count and die size;</text></clause><clause id="HDB55B537AD61467F80244D05DC4AD779"><enum>(vii)</enum><text>process node used per design;</text></clause><clause id="H80EE9AB5E59E4B40B1EC576408C3BB4F"><enum>(viii)</enum><text>energy efficiency;</text></clause><clause id="H4D756DA825184C7F816A6010249D8922"><enum>(ix)</enum><text>manufacturing cost and yield assumptions;</text></clause><clause id="H0FC95E2420684C3F886FD85875F4F8B9"><enum>(x)</enum><text>ability of the integrated circuit to effectively run artificial intelligence models trained on a different chip designer’s integrated circuit, including measurements such as model inference in tokens per second and cost per token with and without a software application layer that improves model translation ability;</text></clause><clause id="H476394832DA943B3BDBEB4F3C27D19EF"><enum>(xi)</enum><text>the capability of the most advanced server configuration produced using the chip designer’s integrated circuits including such technical specifications like floating point operations per second, memory capacity and bandwidth, energy efficiency, and ability to function at scale; and</text></clause><clause id="H97DB0C97E2104238AA68E732D79C7FFD"><enum>(xii)</enum><text>any future specification that becomes relevant to the development of future artificial intelligence capability; and</text></clause></subparagraph><subparagraph id="HF646300E091042ADAE858B04B32B31B1"><enum>(B)</enum><text>with respect to such chip designers—</text><clause id="H7995E4D062584523AD195F814580C2AC"><enum>(i)</enum><text>the total number and types of integrated circuits produced in the year preceding submission of such report and the projected production number for the year proceeding submission of such report;</text></clause><clause id="HE3013A75F51F4E66B85DB94FB2C37B44"><enum>(ii)</enum><text>the foundries used in the production of the integrated circuits;</text></clause><clause id="HC6BBBD25A3ED4351BDF0358022E3B984"><enum>(iii)</enum><text>the software ecosystem, including any parallel computing platforms, programming models, or development frameworks that enable accelerated computing for artificial intelligence training or inference;</text></clause><clause id="H36621353BC2C46DFAF8FB99D1B5CF902"><enum>(iv)</enum><text>the method and extent to which such integrated circuits are used in other countries, including in the United States; and</text></clause><clause id="H9CCE9C225C18439B9EC7F2D15A0EEAC3"><enum>(v)</enum><text display-inline="yes-display-inline">the manufacturer’s ability to produce a software application layer required to achieve an improved token per seconds and cost per token rate.</text></clause></subparagraph></paragraph><paragraph id="HF19268FA2D9A40A784E7271BC3DBC051"><enum>(2)</enum><text>An assessment of leading semiconductor fabrication facilities in China that produce logic integrated circuits for use in advanced artificial intelligence training or inference, including such facilities owned or operated by the Semiconductor Manufacturing International Corporation, that includes, with respect to such facilities, the—</text><subparagraph id="HC7538D88351D449DA9E7736B57FA2E59"><enum>(A)</enum><text>total monthly production capacity per advanced process node with non-planar transistors or <fraction>16/14</fraction> nm and below and the percentage of that monthly production capacity dedicated to production of logic integrated circuits for use in advanced artificial training or inference;</text></subparagraph><subparagraph id="HA849680E25254709A216DAC5D0847DFF"><enum>(B)</enum><text>yield for producing such logic integrated circuits for use in advanced artificial intelligence training or inference at each facility with an assessment of that yield in industry relevant terms, such as compared to Chinese firms, compared to non-Chinese firms, or how many are in current industry-leading datacenters;</text></subparagraph><subparagraph id="H280F767FB9054F9D9352CF06E0C35016"><enum>(C)</enum><text>most advanced process node under production;</text></subparagraph><subparagraph id="H06312EC3198E4B5B9EDF9C2E42660509"><enum>(D)</enum><text>types and volume of semiconductor manufacturing equipment used, the country of origin for such equipment, and the export control regulatory regime under which such equipment was procured;</text></subparagraph><subparagraph id="HC7046F6A0AA845F0B370655152E5424F"><enum>(E)</enum><text>collaborations, licit or illicit, between Chinese firms or their subsidiaries and non-Chinese firms and the advancements those collaborations produce for the Chinese firm;</text></subparagraph><subparagraph id="H02B7174D48184AC4A41037FEB7E00657"><enum>(F)</enum><text>progress Chinese firms are making at indigenizing export controlled technologies;</text></subparagraph><subparagraph id="HDA3BE40F4D6C4ED1B404F0C4088BE75A"><enum>(G)</enum><text>market share Chinese firms have in China and internationally; and</text></subparagraph><subparagraph id="HFA71CCE5378D4676A5F89E923EBE6D45"><enum>(H)</enum><text>year-over-year trends in leading semiconductor fabrication facilities during at least the preceding 5-year period;</text></subparagraph></paragraph><paragraph id="HFCD76BC716A2455D82847184F6D87B7F"><enum>(3)</enum><text>An assessment of leading semiconductor fabrication facilities in China that produce memory integrated circuits used for advanced artificial intelligence training or inference, including such facilities owned or operated by ChangXin Memory Technologies or Yangtze Memory Technologies Corp., that includes—</text><subparagraph id="H4D647F7372A4467A86231A54B39932F6"><enum>(A)</enum><text>with respect to such circuits, the—</text><clause id="HCA781A6D96024BA2BEAE9CF2BC6FD9DF"><enum>(i)</enum><text>most advanced generation of high-bandwidth memory, including the technical specifications and stack height;</text></clause><clause id="H93A65956C8E74EE5A4E0965B85265C50"><enum>(ii)</enum><text>smallest half-pitch and the per-die capacity of other dynamic random access memory integrated circuits; and</text></clause><clause id="H8FFEB6351F6643E2AEB3C3F34EE4843F"><enum>(iii)</enum><text>highest number of layers in three-dimensional NOT–AND memory integrated circuits;</text></clause></subparagraph><subparagraph id="H7A7C7CBE4D414BA9AD34C64E319F67EF"><enum>(B)</enum><text>with respect to such facilities, the—</text><clause id="HE9A08DC0CCCA497BB9F47DBA888A76A0"><enum>(i)</enum><text>yield and total monthly production capacity for memory integrated circuits, including dynamic random access memory such as high-bandwidth memory, and NOT–AND memory; and</text></clause><clause id="HF0460185DEDC4E6CA357640A34DDC1B2"><enum>(ii)</enum><text>types and volume of semiconductor manufacturing equipment used, including the country of origin of such equipment and the export control regulatory regime such equipment was procured under.</text></clause></subparagraph><subparagraph id="HEC4A6E10B83F4D89A742FAABCABB1B34"><enum>(C)</enum><text>collaborations, licit or illicit, between Chinese firms or their subsidiaries and non-Chinese firms and the advancements those collaborations produce for the Chinese firm;</text></subparagraph><subparagraph id="HE997E14AB2F24C1D874BEF86F9A75791"><enum>(D)</enum><text>progress Chinese firms are making at indigenizing export controlled technologies;</text></subparagraph><subparagraph id="H45CF3B92A877489CAC194F68D69E12DC"><enum>(E)</enum><text>market share Chinese firms have in China and internationally; and</text></subparagraph><subparagraph id="HB39523F8DA914F9BB91D707D10FAAC2E"><enum>(F)</enum><text>year-over-year trends in China’s advanced memory integrated circuit production for a minimum of the 5 previous years.</text></subparagraph></paragraph><paragraph id="H4A5735FE0E994A948E9CF45E4A143137"><enum>(4)</enum><text>An assessment of leading semiconductor manufacturing equipment companies in China, including NAURA Technology Group, KINGSEMI, Advanced Micro-Fabrication Equipment Inc., Shanghai Micro Electronics Equipment, and Shenzhen SiCarrier Technologies Co., Ltd, that includes—</text><subparagraph id="H0C33BF64D8A44F7BB82B3C6CD588E638"><enum>(A)</enum><text>a categorical breakdown of annual unit production volume and technical specifications, including minimum feature size, throughput, and defect rate, of all major equipment classes installed or under development for wafer production in foundries in China, including—</text><clause id="HCE89C38782044007BEEC959AD0E8474D"><enum>(i)</enum><text>lithography tools, including photolithography, nanoimprint, and electron beam lithography tools;</text></clause><clause id="H77EAD80D388E44B98DF4CD5F6B699BA7"><enum>(ii)</enum><text>etch equipment, including wet etching and dry etching;</text></clause><clause id="H13BFBC2CEF45482CA4707188FD9A361B"><enum>(iii)</enum><text>deposition equipment, including chemical vapor deposition, physical vapor deposition, and atomic layer deposition;</text></clause><clause id="H2DEE055EB14B47C48696B130104C9A1F"><enum>(iv)</enum><text>cleaning systems;</text></clause><clause id="H78E6DCEDBEA046A6936E234F694F8BF4"><enum>(v)</enum><text>chemical mechanical planarization tools;</text></clause><clause id="H190609B5D58A4F5AA9AD2F34883C55CA"><enum>(vi)</enum><text>ion implantation and diffusion systems;</text></clause><clause id="H5FEF7372AA934BFA9A5F00B6F30B33C1"><enum>(vii)</enum><text>wafer inspection, metrology, and process control tools;</text></clause><clause id="H12216516C6134BA2968FED1040D7EAB4"><enum>(viii)</enum><text>back-end packaging equipment, including wafer dicing equipment and wire bonders;</text></clause><clause id="H08FA69FFB0D345E788D8D3E65046E251"><enum>(ix)</enum><text>capabilities and advancements in advanced packaging technologies;</text></clause><clause id="H85D328CAB3AF4E2980225DCF09152AD1"><enum>(x)</enum><text>thermal processing equipment;</text></clause><clause id="H7D1C0C3884D14FBDA876837344226F65"><enum>(xi)</enum><text>bonding equipment, including thermo compression bonders and hybrid bonders;</text></clause><clause id="H58D793071539448AB22C7658EEBCF711"><enum>(xii)</enum><text>environmental control systems;</text></clause><clause id="H7216D5EE3B164B7EAA233893B1F371E1"><enum>(xiii)</enum><text>laser systems; and</text></clause><clause id="H5E1A05B444E448DF9E58DD7FFDBBFB4D"><enum>(xiv)</enum><text>reticle and photomask writing and inspection tools;</text></clause></subparagraph><subparagraph id="HA821351F8BCC4A4FA1A1DB400FCDD89B"><enum>(B)</enum><text>the country of origin and supplier company for each piece of semiconductor manufacturing equipment used in foundries in China for advanced-node logic or high-bandwidth memory production by such companies;</text></subparagraph><subparagraph id="H83B2297B60E644E79DD389BD6E3DB4A2"><enum>(C)</enum><text>the foreign-sourced subcomponents integrated into the semiconductor manufacturing equipment produced by such companies, including precision motion stages, lasers, electrostatic chucks, optical systems, radio frequency generators, or extreme-purity gas handling systems;</text></subparagraph><subparagraph id="H33F15852A365486C9EF18B0495A736A6"><enum>(D)</enum><text>collaborations, licit or illicit, between Chinese firms or their subsidiaries and non-Chinese firms and the advancements those collaborations produce for the Chinese firm;</text></subparagraph><subparagraph id="HD3E6051531E04C37B8BC0A29FABE50D1"><enum>(E)</enum><text>progress Chinese firms are making at indigenizing export controlled technologies;</text></subparagraph><subparagraph id="H403B1DDB539F4CD29A4F287D6E28BB8C"><enum>(F)</enum><text>market share Chinese firms have in China and internationally; and</text></subparagraph><subparagraph id="HA8777AC090114B44A3F859601C744814"><enum>(G)</enum><text>year-over-year trends in leading semiconductor manufacturing equipment companies in China for a minimum of the 5 previous years.</text></subparagraph></paragraph><paragraph id="HF549700786294583A9D580F0D81CB971"><enum>(5)</enum><text>An assessment of electronic design automation (EDA) software used in the design of integrated circuits for advanced artificial intelligence applications in China, including software developed or provided by leading Chinese EDA companies such as Empyrean Technology Co., Ltd. and Primarius Technologies Co., Ltd., that includes—</text><subparagraph id="HF957E422DB1C429E8F6AAE6C19EF6DA8"><enum>(A)</enum><text>with respect to such software tools, the—</text><clause id="HC7E4278D3704429985E3230EEAE52421"><enum>(i)</enum><text>range of design stages supported, including front-end design such as architecture and register-transfer level design, logic synthesis, verification, physical design, place-and-route, timing closure, and final signoff;</text></clause><clause id="H52C384CD90F34EF1B424137244CF702A"><enum>(ii)</enum><text>compatibility with advanced process nodes, including sub-7 nanometer technologies, gate-all-around devices, and three-dimensional integration;</text></clause><clause id="H79E7677738B24639AD7045A1A863CD48"><enum>(iii)</enum><text>capabilities for designing artificial intelligence-specific components of such integrated circuits, including tensor processing cores, systolic array processing units, matrix multiplier units, and high-bandwidth memory interfaces;</text></clause><clause id="H7969934764BC4CF3B70749C4547E6F04"><enum>(iv)</enum><text>ability to model and optimize for power, performance, and thermal constraints in artificial intelligence workloads;</text></clause><clause id="H9D9D8C08F9AB4C36B7070A0A69B90FA0"><enum>(v)</enum><text>scale and performance of the software in handling large designs, such as chips exceeding 50–100 billion transistors; and</text></clause><clause id="H68F912C5DA3B48068CA47704FEB3796D"><enum>(vi)</enum><text>integration with cloud compute resources or distributed workflows for large-scale artificial intelligence chip development;</text></clause></subparagraph><subparagraph id="HF3AA025B793A4B54A41DC2DA22460878"><enum>(B)</enum><text>with respect to such companies, the—</text><clause id="H0C5A0E7A975142E1B953F4BD9AA99E26"><enum>(i)</enum><text>total market share within China and internationally, including the share of advanced-node integrated circuits designed or optimized for advanced artificial intelligence training or inference designs supported by each company; and</text></clause><clause id="H7394C23BEF3041F1A737C73524F35A53"><enum>(ii)</enum><text>types, volume, and origin of critical technology components used in software development, including intellectual property cores, third-party libraries, verification suites, and artificial intelligence-assisted optimization algorithms;</text></clause></subparagraph><subparagraph id="H16C7E8559D234B659B5C9675315E0B1A"><enum>(C)</enum><text>progress Chinese firms are making at indigenizing export-controlled or foreign-origin technologies used in EDA, including high-performance computing integration, advanced verification engines, and proprietary intellectual property cores;</text></subparagraph><subparagraph id="H87133CCFE5D34CD2A8D6540DF2F00CD0"><enum>(D)</enum><text>year-over-year trends for China’s EDA industry over a minimum of the previous 5 years, including technology adoption, market share, and software capability evolution; and</text></subparagraph><subparagraph id="H4F0366DAB4B046BB945E0FE5D10EC693"><enum>(E)</enum><text>identification of technical gaps relative to leading global EDA providers, particularly in relation to artificial intelligence-focused design, advanced nodes, and large-scale verification.</text></subparagraph></paragraph><paragraph id="H5AAF69DD614045D8ADBA23E3E58A898A"><enum>(6)</enum><text>An assessment of the advanced artificial intelligence models determined by the Secretary to be the most relevant to the national security of the United States that were developed by artificial intelligence laboratories or companies based in China, especially those laboratories and companies affiliated with the People’s Liberation Army or any university in China, including the most advanced models, open-weight and closed-weight models, based on model size, total compute used during training, benchmark performance, and any other advanced capabilities the Secretary determines relevant, that includes, with respect to each such model—</text><subparagraph id="H40F30377D2AC4AE390941EDD1F547672"><enum>(A)</enum><text>the number of model parameters;</text></subparagraph><subparagraph id="H39616E3EC06B443494C1B4AA331E1424"><enum>(B)</enum><text>the total training compute used, measured in floating-point operations and their relevant precision level;</text></subparagraph><subparagraph id="HEBDC144326FE42728A1BA3B272E7B58C"><enum>(C)</enum><text>the model performance on benchmark tasks;</text></subparagraph><subparagraph id="H616FBF938AA74428B6047D8E69C13AA7"><enum>(D)</enum><text>an evaluation of the extent to which the model exhibits advanced cyber offensive capabilities, an advanced understanding of biological and virological application domains, and the ability to substantially automate or accelerate artificial intelligence research, and a comparison of such models to the most advanced artificial intelligence models from United States developers;</text></subparagraph><subparagraph id="H06F085BCD98243C48CEC3E775A164484"><enum>(E)</enum><text>if the model is open-weight, an evaluation of the files provided and the security implications of following the developer’s deployment instructions;</text></subparagraph><subparagraph id="H738AA720893E47E39C440325E45295A8"><enum>(F)</enum><text>a description of the algorithmic alignment training used;</text></subparagraph><subparagraph id="HC71856BB4CF248F9839FC898B3E3FF92"><enum>(G)</enum><text>the type and scale of compute infrastructure used in training and inference, including the cluster configurations, the number and type of integrated circuits specifically designed or optimized for advanced artificial intelligence training or inference, how such integrated circuits were acquired and from which companies, where those clusters are located, and how they are being accessed;</text></subparagraph><subparagraph id="H8F285C24B10F409A9818940E02ED5770"><enum>(H)</enum><text>the manner and extent to which the model is used throughout society in China, including throughout the following industries or sectors:</text><clause id="HBA1DBA9E867247D5B01A0921711FD946"><enum>(i)</enum><text>the People’s Liberation Army;</text></clause><clause id="H957995FDF4844911B9686CB09C08F353"><enum>(ii)</enum><text>the surveillance and intelligence collection functions of the Chinese Communist Party (CCP), including the genocide of Uyghur Muslims and other religious and ethnic minorities in the Xinjiang Uyghur Autonomous Region;</text></clause><clause id="HD30C51D524524FA19C07BEDEFC107A24"><enum>(iii)</enum><text>the Government of China;</text></clause><clause id="HEA91F06CEA4C4D54BC8597D26C959CCE"><enum>(iv)</enum><text>business and finance;</text></clause><clause id="HD5FA7C68E3214E518AE7BD96C5C8BC49"><enum>(v)</enum><text>education;</text></clause><clause id="HA0E50F7B537946D6931BB57925FC2FA3"><enum>(vi)</enum><text>healthcare;</text></clause><clause id="HBF5BB46A2EC84FA682FD9C4FD9FE42DF"><enum>(vii)</enum><text>critical infrastructure sectors, including the power grid and transportation; and</text></clause><clause id="HDD31E0DFF52145F3A9926DB342B26E32"><enum>(viii)</enum><text>any other sectors that the Secretary determines to be relevant, such as high-risk industries where artificial intelligence failure would have outsized safety or mission consequences.</text></clause></subparagraph><subparagraph id="H9FB64A793AB847B68C8DA7DE70C8E1E1"><enum>(I)</enum><text>whether and where such models are deployed for public use, including API access or mobile app deployment;</text></subparagraph><subparagraph id="H8A1D56FF70ED486BAB0F40F742C6343A"><enum>(J)</enum><text>the manner and extent to which such models are diffused in other countries, including the United States;</text></subparagraph><subparagraph id="H8CBB9066B6F948EE9CF4215A21C7B2B3"><enum>(K)</enum><text>the alignment of those models to CCP propaganda;</text></subparagraph><subparagraph id="H83C22E9A80DF4326827A57F89913CF31"><enum>(L)</enum><text>the potential of those models to inject or create vulnerabilities for users or other ways they could be used to further CCP national security objectives;</text></subparagraph><subparagraph id="H7A36197026DC4FCF88E352E0BE657E13"><enum>(M)</enum><text>an assessment of global market share of Chinese models and the effect that global market share is enabling China to set artificial intelligence hardware or software standards; and</text></subparagraph><subparagraph id="H7B3AB1095D804E2493F3D45D8C5D1D03"><enum>(N)</enum><text>the total number of tokens inferenced globally using the model, the types of hardware utilized for such inference and the percent breakdown between company of origin for such hardware, and the percentage of global inferenced tokens attributable to the model.</text></subparagraph></paragraph><paragraph id="HEE369F3CE8C241B592F1BAC846024B34"><enum>(7)</enum><text>An assessment of emerging artificial intelligence research in China, based on indicators such as academic publications, patent filings, and research funding, including—</text><subparagraph id="H84F67A2C435B443197478CD5D840D0E6"><enum>(A)</enum><text>the development of novel artificial intelligence algorithms and techniques, including advancements in reinforcement learning, natural language processing, or computer vision, with a focus on algorithms and techniques most relevant for developing or deploying the most advanced artificial intelligence systems;</text></subparagraph><subparagraph id="H975EE1FD328340D5B49886DE3A2EF9CA"><enum>(B)</enum><text>advancements in hardware designed to enhance artificial intelligence capabilities, including custom integrated circuits, quantum computing technologies, or neuromorphic computing systems, with a focus on hardware advancements most relevant for developing or deploying the most advanced artificial intelligence systems;</text></subparagraph><subparagraph id="H14086E6D7F84417E9AFB3285F543BE3D"><enum>(C)</enum><text>the scale and focus of research efforts, including the number of researchers, institutions, and collaborations involved, and the funding levels and sources, with a focus on those most relevant for developing or deploying the most advanced frontier artificial intelligence systems;</text></subparagraph><subparagraph id="H623BE155C5614776A406ABB9E6081B43"><enum>(D)</enum><text>an evaluation of the potential impact of such research on future artificial intelligence capabilities relevant to national security competitiveness; and</text></subparagraph><subparagraph id="H5CCE22898CA64ACE9181B20CD9FA5D0E"><enum>(E)</enum><text>a description of licit or illicit methods or tactics such as unauthorized model distillation used by Chinese entities to steal non-Chinese artificial intelligence related intellectual property.</text></subparagraph></paragraph><paragraph id="H9EC97C7B4C764987A84CEDD110C54D42"><enum>(8)</enum><text>An assessment of the aggregate public funding and capital flows supporting artificial intelligence development in China, including—</text><subparagraph id="H4337290833014032B696B9EAF1380CDC"><enum>(A)</enum><text>the sum total of China’s national, provincial, and municipal investment in artificial intelligence;</text></subparagraph><subparagraph id="H8757E65364244C9F92006DB1F77EFDB6"><enum>(B)</enum><text>subsidies that are underwriting the costs of artificial intelligence development in areas such as compute, infrastructure, water, and energy;</text></subparagraph><subparagraph id="H91C2D54B82A0440AA6BD9A9A673ED9E5"><enum>(C)</enum><text>an assessment of foreign capital investments, including the total amount invested and a breakdown by entity, including the country of origin and the amount invested; and</text></subparagraph><subparagraph id="HC7C416FB978E4E97ADEE9DF1B34AB75F"><enum>(D)</enum><text>an assessment of the PRC-based entities that have received the funding, including the name of the entity and the amount of funding received.</text></subparagraph></paragraph><paragraph id="H801DDDD066124B7188DC4D242C440CE5"><enum>(9)</enum><text>The aggregate artificial intelligence computational capacity in China, including—</text><subparagraph id="HF09BD294B61A4659B8DC09430EA3A547"><enum>(A)</enum><text>a detailed analysis of computational capacity of the 5 most capable entities in China, including the number and types of integrated circuits and server systems used and their aggregate computational power;</text></subparagraph><subparagraph id="HA8EE099FC8D94CD0A71BDBDB27FA4A84"><enum>(B)</enum><text>the countries and companies with respect to which China sourced their computational capacity; and</text></subparagraph><subparagraph id="HF352664A11FD4E2A894EC2C14D9CF0BD"><enum>(C)</enum><text>the locations and specifications, including energy and computational capacity, of datacenters used for advanced artificial intelligence training and inference.</text></subparagraph></paragraph><paragraph id="H7D815BF3742740088B32F2813E5D65C1"><enum>(10)</enum><text>An assessment of leading humanoid robot manufacturers in China, including Unitree Robotics and Fourier, that includes—</text><subparagraph id="H125BDE6B8CB247949C3D465B77FE34B0"><enum>(A)</enum><text>with respect to such manufacturers, the—</text><clause id="H86F4CCE2468B44958BFB484F2A04DBC6"><enum>(i)</enum><text>production capacity per year; and</text></clause><clause id="H1C5B368F29304427B23287EB61D7E9B1"><enum>(ii)</enum><text>unit cost and pricing trends for such robots intended for commercial deployment; and</text></clause></subparagraph><subparagraph id="H228D1637ECCE489484594E20F4B24636"><enum>(B)</enum><text>with respect to the humanoid robots produced by such manufactures—</text><clause id="H850C2E0C93034800A3E433582E5E337B"><enum>(i)</enum><text>the number, type, and country and company of origin of the semiconductor components, including integrated circuits, used to build, run, or train such robots;</text></clause><clause id="HBBFD380805CB4CF5BA5219D2B278518F"><enum>(ii)</enum><text>the country and company of origin and the technical specifications of critical components used in such robots, including actuators, sensors, and battery systems, and if not Chinese, the progress toward indigenization;</text></clause><clause id="H511D7376EF6F46419DFC4B927A9DFFCA"><enum>(iii)</enum><text>a description of the tasks such robots can perform;</text></clause><clause id="H2E352A30B2E64AA59267356783C983AB"><enum>(iv)</enum><text>whether such robots are teleoperated, operated through hard-coded instructions, or function autonomously using artificial intelligence models;</text></clause><clause id="H1973AF768FBF4CA493AC57E05BDDFFBD"><enum>(v)</enum><text>whether inference is performed locally or via remote cloud services;</text></clause><clause id="HE56395C0F62246F89E62FA8CDFA4D4EB"><enum>(vi)</enum><text>the number of such robots deployed across China, including in the military, manufacturing, logistics, health care, security, and personal assistance sectors;</text></clause><clause id="H56C184ED14E9413FAF544E7B1DF73729"><enum>(vii)</enum><text>the extent to which, and ways in which, such robots are diffused in other countries, including in the United States; and</text></clause><clause id="H1F68921D8436441A86083F555B454B94"><enum>(viii)</enum><text>an assessment of the cybersecurity and other vulnerabilities of Chinese origin robotic systems.</text></clause></subparagraph></paragraph><paragraph id="H91F9BD67E98946388D54DBE7665EF090"><enum>(11)</enum><text>An assessment of the most advanced or widely used artificial intelligence-powered applications developed by Chinese entities or built on Chinese artificial intelligence models, including—</text><subparagraph id="HEDE1824B25E04CA98A6D79083AB72296"><enum>(A)</enum><text>the artificial intelligence models used to power these applications, including the company and country of origin for each model and whether the models are open-weight or closed-weight;</text></subparagraph><subparagraph id="H461FD6A8B9D74013B372695B3D228307"><enum>(B)</enum><text>the means of deployment and the extent to which such applications are used, including in the United States;</text></subparagraph><subparagraph id="H3CD6374DB58E45B2A5AC006B3E67A82C"><enum>(C)</enum><text>the purposes, capabilities, and promoted uses of the applications;</text></subparagraph><subparagraph id="H62851F7A20694D138FD95DDF8F8F52FC"><enum>(D)</enum><text>an analysis of how data collected or generated by the applications is used, including for artificial intelligence model training, surveillance, or other national security-relevant purposes; and</text></subparagraph><subparagraph id="H05B2C705FE9C4D3EA0DD01523338C584"><enum>(E)</enum><text>an evaluation of the potential risks posed by these applications to United States national security, foreign policy objectives, or data privacy.</text></subparagraph></paragraph><paragraph id="HBBD49E3B6CD54C068F74469027C68C8A"><enum>(12)</enum><text>An assessment of the regulatory framework governing artificial intelligence development, deployment, and usage in China, that includes—</text><subparagraph id="H7533B371A7BB4A478176F8B2A68E8189"><enum>(A)</enum><text>the explicit restrictions on artificial intelligence models, including laws, regulations, and government policies that directly limit or control the development, deployment, or use of artificial intelligence models in China;</text></subparagraph><subparagraph id="HD42807A97B6346389CA61D026118E7F6"><enum>(B)</enum><text>an analysis of the implicit restrictions on artificial intelligence models, including censorship, data access limitations, or other indirect controls that may constrain artificial intelligence model capabilities;</text></subparagraph><subparagraph id="HDC99FBE1A1C74FA48DDBEB71C2E39EEE"><enum>(C)</enum><text>how such explicit and implicit restrictions impact the development, deployment, and diffusion of artificial intelligence models both within China and internationally, including the effects on innovation, competitiveness, and national security;</text></subparagraph><subparagraph id="H7C6334ED6BAA40948349DB6733C49C83"><enum>(D)</enum><text>an analysis of efforts by the CCP to acquire greater insight into advanced artificial intelligence and reduce strategic surprise, such as efforts that require advanced artificial intelligence developers to disclose information about artificial intelligence systems or provide models to government entities;</text></subparagraph><subparagraph id="H72EB3ABE7D1147A6ADBB047E64D62FD3"><enum>(E)</enum><text>an analysis of efforts in China to assess or mitigate national security or public safety threats from advanced artificial intelligence systems, including efforts to prevent loss of control from autonomous artificial intelligence systems; and</text></subparagraph><subparagraph id="H9B17838BC95941E0909ED7FD72A3FB3B"><enum>(F)</enum><text>the goals for artificial intelligence development explicitly and implicitly stated by the CCP.</text></subparagraph></paragraph><paragraph id="H91CD8E9F794341E59722E893A9C3DEA9"><enum>(13)</enum><text>An assessment of China’s global artificial intelligence standards diplomacy efforts, including—</text><subparagraph id="H208A40F437D6464A8D99F88724A9DC5C"><enum>(A)</enum><text>mapping the fora where Chinese actors aimed to shape global standards;</text></subparagraph><subparagraph id="H0B010409E17D480085B0F69A1D981B8D"><enum>(B)</enum><text>jurisdictions where Chinese-promoted standards, model laws, guidance, or procurement criteria have been adopted or referenced;</text></subparagraph><subparagraph id="HDC1EA443C3BB4CEBB796E55644E71BD6"><enum>(C)</enum><text>the effects on procurement and vendor eligibility; and</text></subparagraph><subparagraph id="HE938CBEC1471469F885D5A3BDC93DA07"><enum>(D)</enum><text>opportunities for the United States to shape global artificial intelligence standards and counter Chinese efforts.</text></subparagraph></paragraph><paragraph id="H3B8025F15A72447496314A634CC990D8"><enum>(14)</enum><text>An assessment of the degree to which entities in China remotely accessed artificial intelligence computational resources, including through cloud services, international data centers, or through circumvention or avoidance of United States export controls.</text></paragraph><paragraph id="HAF4A25E7F7024592B82582D80DC87AA5"><enum>(15)</enum><text>An assessment of the methods, pathways, quantities, and companies and countries of origin of United States-controlled integrated circuits specifically designed or optimized for advanced artificial intelligence training or inference, including graphics processing units or application-specific integrated circuits, that have been diverted to mainland China, the estimated total compute capacity enabled through these chip diversions, and the percent of China’s total compute capacity enabled through these chip diversions.</text></paragraph><paragraph id="H54441977C721415985FA9FA87A126569"><enum>(16)</enum><text>An assessment of the effectiveness of United States export controls in restricting access by China to artificial intelligence-relevant technologies, including an identification of loopholes within United States export controls and recommendations for legislative and administrative action to strengthen export controls and enforcement that is consistent with United States national security and foreign policy objectives.</text></paragraph></subsection><subsection id="H7973F018A6E748CA9D19A9028696887A"><enum>(c)</enum><header>Prioritization</header><text>In conducting the assessments required under subsection (b), the Secretary shall prioritize the identification and analysis of—</text><paragraph id="HA1C25A4CFC1D4FB3BDDD5F8E4E3E0D50"><enum>(1)</enum><text>semiconductors, semiconductor manufacturing equipment, and critical components of semiconductor manufacturing equipment that are, or are likely to become, critical to the supply chains for the training or inference of the most advanced artificial intelligence systems; and</text></paragraph><paragraph id="HF031CBDE60B6467EB5E1F184A4EF45D4"><enum>(2)</enum><text>items that enable or could enable advanced model performance, are associated with systems that pose significant national security or strategic implications to the United States, or are likely to be foundational to the development of future advanced artificial intelligence systems, including those not yet deployed or publicly disclosed.</text></paragraph></subsection><subsection id="H1201A2313E35425F97BD4431CCB3B587"><enum>(d)</enum><header>Reference class</header><text>Where applicable, the Secretary shall provide context to all statistics regarding China’s artificial intelligence power in the report by presenting China’s capabilities and production numbers in comparison to relevant United States and partner country production numbers and capabilities.</text></subsection><subsection id="HED375095F5744BBF81D2053FC671D024"><enum>(e)</enum><header>Coordination with expert entities</header><text>In carrying out this section, the Secretary may consult and coordinate with other Federal departments and agencies, private industry or research organizations, federally funded research and development centers, national laboratories, academic institutions, relevant media outlets, or any other entities with expertise in semiconductor technologies, artificial intelligence, or national security that the Secretary determines relevant.</text></subsection><subsection id="HE0EE711B54AB4D649BE9492C66CDCEB6"><enum>(f)</enum><header>Form</header><text display-inline="yes-display-inline">The report required by subsection (a) shall be submitted in unclassified form and may contain a classified annex.</text></subsection><subsection id="HC2E46B1970BA4EA0ABC8E3F0C85CA6CD"><enum>(g)</enum><header>Mandatory unclassified elements</header><text>In the unclassified portion of the report required under subsection (a), the Secretary shall include—</text><paragraph id="H6CC274D00BA041F8A106886FFC9E5EAC"><enum>(1)</enum><text>the number of integrated circuits specifically designed or optimized for advanced artificial intelligence training or inference produced by leading entities in China in the year preceding submission of such report;</text></paragraph><paragraph id="HFD14379BEADD41378CDF28B980AF3999"><enum>(2)</enum><text>the projected production numbers of integrated circuits from China specifically designed or optimized for advanced artificial intelligence training or inference, including identification of foundries responsible for such production, for the year proceeding submission of such report; and</text></paragraph><paragraph id="H327AED50FD594E1E9757696F28F9BE87"><enum>(3)</enum><text>the extent to which and ways artificial intelligence-relevant technologies in China, including integrated circuits, models, semiconductor manufacturing equipment, and humanoid robots are diffused in other countries, including the United States.</text></paragraph></subsection><subsection id="H7D7ABAEB8EC04191926538842753359A"><enum>(h)</enum><header>Definitions</header><text>In this Act:</text><paragraph id="HB9DA7FC68A404576B086692F0B4AB92D"><enum>(1)</enum><header>Secretary</header><text>The term <quote>Secretary</quote> means the Secretary of Commerce.</text></paragraph><paragraph id="H9BF34777D1F94C7984426402EB98BB27"><enum>(2)</enum><header>Covered agency heads</header><text>The term <quote>covered agency heads</quote> means the—</text><subparagraph id="HA99C29E1F90447A69AF49466AC7C924D"><enum>(A)</enum><text>Secretary of State;</text></subparagraph><subparagraph id="HB62B5C08E3D240FEB1F6F58180BD60DF"><enum>(B)</enum><text>Secretary of Defense;</text></subparagraph><subparagraph id="H422BFAAC63C74BCD9401C59FA001CA8D"><enum>(C)</enum><text>Secretary of Energy;</text></subparagraph><subparagraph id="H8D4423C31F8C46A3943394347B8AADFF"><enum>(D)</enum><text>Director of National Intelligence;</text></subparagraph><subparagraph id="H5177F60815EF4C9BB9DAE70154BF3924"><enum>(E)</enum><text>Director for the White House Office of Science and Technology Policy; and</text></subparagraph><subparagraph id="H3145099952FC43F1A50211604FB31DE2"><enum>(F)</enum><text>head of any other relevant Federal department or agency the Secretary determines necessary.</text></subparagraph></paragraph></subsection></section></legis-body></bill> 

